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Список видань за алфавітом назв: Авторський покажчик Покажчик назв публікацій  |
Пошуковий запит: (<.>A=Khrystosenko R$<.>) | |||
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Загальна кількість знайдених документів : 5 Представлено документи з 1 до 5 |
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| 1. | 
Indutnyi I. Z. Nanostructured Au chips with enhanced sensitivity for sensors based on surface plasmon resonance [Електронний ресурс] / I. Z. Indutnyi, Yu. V. Ushenin, V. I. Myn'ko, P. E. Shepeliavyi, M. V. Lukaniuk, A. A. Korchovyi, R. V. Khrystosenko // Ukrainian journal of physics. - 2017. - Vol. 62, № 5. - С. 365-371. - Режим доступу: http://nbuv.gov.ua/UJRN/Ukjourph_2017_62_5_3 | ||
| 2. | 
Khrystosenko R. V. Optimization of the surface plasmon resonance minimum detection algorithm for improvement of method sensitivity [Електронний ресурс] / R. V. Khrystosenko // Semiconductor physics quantum electronics & optoelectronics. - 2015. - Vol. 18, № 3. - С. 279-285. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2015_18_3_9 Developed in this work is the information technology for improvement of the sensitivity inherent to the surface plasmon resonance (SPR) method by optimization of the resonance curve minimum detection algorithm. Simulation of SPR sensor response has been performed using the Fresnel equations with account of noise contribution and the Jones calculus. It has been demonstrated that using third-order polynomial approximation in the angular scanning range of <$Etheta sub roman SPR ~symbol С~0,5 symbol Р> with 100 experimental points improves the sensitivity of "Plasmon" series instruments by an order of magnitude. | ||
| 3. |
Dan'ko V. A. Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist [Електронний ресурс] / V. A. Dan'ko, G. V. Dorozinsky, I. Z. Indutnyi, V. I. Myn'ko, Yu. V. Ushenin, P. E. Shepeliavyi, M. V. Lukaniuk, A. A. Korchovyi, R. V. Khrystosenko // Semiconductor physics, quantum electronics & optoelectronics. - 2015. - Vol. 18, № 4. - С. 438-442. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2015_18_4_13 This study reports on development of the interference lithography (IL) technique applying the resist based on chalcogenide glass films for fabrication of gold chips in the form of periodic surface nanostructures for surface plasmon resonance (SPR) refractometers. The IL technique was optimized for patterning the Au layers and formation of one-dimensional (grating) structures with the spatial frequency close to 3300 mm<^>-1 | ||
| 4. |
Khrystosenko R. V. Optimization of surface plasmon resonance based biosensor for clinical diagnosis of the Epstein–Barr herpes virus disease [Електронний ресурс] / R. V. Khrystosenko // Semiconductor physics, quantum electronics & optoelectronics. - 2016. - Vol. 19, № 1. - С. 84-89. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2016_19_1_18 The influence of the sensitive element fabrication technology and noise performance of surface plasmon resonance (SPR) immunosensor on sensitivity and stability of operation inherent to the "Plasmon" series instrument has been investigated to improve reliability of diagnosis and treatment of the Epstein - Barr herpes virus disease. To minimize the effect of the temperature change induced noise, compensation (introduction of the reference channel) and stabilization (active thermal control) methods were applied, allowing to substantially enhance resolution of the used SPR sensor system. | ||
| 5. |
Indutnyi I. Z. Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms [Електронний ресурс] / I. Z. Indutnyi, Yu. V. Ushenin, D. Hegemann, M. Vandenbossche, V. I. Myn'ko, P. E. Shepeliavyi, M. V. Lukaniuk, P. M. Lytvyn, R. V. Khrystosenko // Semiconductor physics, quantum electronics & optoelectronics. - 2017. - Vol. 20, № 3. - С. 362-368. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2017_20_3_16 The sensitivity of surface plasmon resonance (SPR) sensors operating in the Kretschmann configuration was investigated using Au SPR chips with a nano-grating surface functionalized via deposition of a-C:H:0 plasma polymer films. The surface of the chips was nanopattemed in order to improve the sensitivity of the sensor, as compared with the sensitivity of standard Au chips with a flat (unstructured) surface. It was found that deposition of the plasma polymer nanofilms neither affected the degree of refractometer sensitivity enhancement, nor the width of the operation range of the environment refractive index (n), in which the enhancement was observed. Such functionalization of the chip surface merely resulted in the shift of the operation range position to smaller values of n in comparison to non-coated chips requiring deposition of stable functional films. | ||
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